The W. M. Keck Microfabrication Facility is the major
lithography facility (electron beam lithography and photolithography) for Michigan State University.
It is a university-wide user facility and is available to the project on a University User Fee basis.
It contains the following major equipment for lithographic fabrication and analysis:
JEOL 840A SEM
Turbo-pumped Edward Auto306 Thermal Evaporator Thin Film Deposition System
Edward Scancoat Six Sputter Coater Thin Film Deposition System
Resist Preparation Equipment
MicroAutomation 1006 Wafer Dicing Saw
AB-M Mask Aligner with near UV and deep UV spectrum
Class 100 cleanroom for photoresist preparation and photolithography
PX-250 March Instruments O2 Plasma Etcher
PTI Batchtop RIE Reactive Ion Etcher
Hitachi S-4700II FESEM
EDAX Phoenix energy dispersive X-ray Micro-analyzer System
Kaiser Optical Systems HoloProbe Micro-Raman Spectrograph coupled to an Olympus BX-60 optical microscope