The W. M. Keck Microfabrication Facility




The W. M. Keck Microfabrication Facility is the major lithography facility (electron beam lithography and photolithography) for Michigan State University. It is a university-wide user facility and is available to the project on a University User Fee basis. It contains the following major equipment for lithographic fabrication and analysis:

Fabrication:

Analysis:


The JEOL 840A SEM is used as an electron beam lithography system to expose electron beam resists such as PMMA according to a computer generated pattern. The instrument specifications include: